AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. The Company was founded in 1983 and is headquartered in Herzogenrath (near Aachen), Germany, with subsidiaries and sales offices in Asia, United States and in Europe. AIXTRON’s technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials. Such components are used in a broad range of innovative applications, technologies and industries. These include LED applications, display technologies, data storage, data transmission, energy management and conversion, communication, signalling and lighting as well as a range of other leading-edge technologies.
AIXTRON’s equipment is used by a diverse range of customers worldwide to manufacture critical, advanced components such as HBTs, PHEMTs, Lasers, LEDs, Detectors and VCSELs used in fibre optic communications systems, wireless and mobile telephony applications, optical storage devices, illumination, signaling and lighting, as well as a range of other leading edge technologies like III/V based high efficiency solar cells. AIXTRON’s customized MOCVD systems are the key technology enabling development and manufacture of compound semiconductors and many other multi-component materials. The many advantages of the AIXTRON Planetary Reactors® and the Shower Head reactor include user-friendly operation, excellent process stability as well as very high precursor efficiencies and world best uniformities. Together with excellent reliability and high throughput, all these properties lead to a valuable device yield and a high uptime. AIXTRON will bring in its competence in the development and adaptation of CVD equipment based on customer requirements as well as its extensive experiences in the hetero epitaxy of III-Nitrides.
AIXTRON has more than 30 years of experience in the development and adaptation of CVD equipment based on customer requirements as well as extensive knowledge in the hetero epitaxy of III-Nitrides on diverse substrates. With a market share of about 50% AIXTRON is the leading manufacturer of MOCVD equipment for LED production. Several publically funded projects successfully run by AIXTRON contribute to the development of LED production technology.
Previous Involvement in Research and Training Programmes
AIXTRON has had numerous funded programs in the last 20 years including German and EU funded projects. In the frame of the finalized FP7 project DUALLOGIC a 200/300 mm cluster MOCVD tool for the selective epitaxy of GaAs based materials on Si has been developed and placed at IMEC. AIXTRON also participates in the national funded project NEULAND and the FP7 project HiPoSwitch, which both deal with technology development for the production of high power electronics on Si and SiC. Several MOCVD reactors have been delivered to international GaN electronics companies.
Key Research Facilities, Infrastructure and Equipment
Full clean room with characterisation and deposition equipment
Contributors to ALMA
Prof. Dr. Michael Heuken received the Diplom‑Ingenieur degree and the Dr.‑Ing. degree in Electrical Engineering from Duisburg University in 1985 and 1989, respectively. He joined the Institut für Halbleitertechnik at RWTH Aachen as senior engineer and has been working in the field of metalorganic vapor phase epitaxy for electronic and optoelectronic devices. In 1994 he finished his Habilitation in semiconductor technology and devices with a thesis on MOCVD technology for optoelectronic devices. Since then and still at present he has been lecturer for semiconductor technology and devices as well as circuits for communication systems at RWTH. In 1997 he joined AIXTRON AG in Aachen-Germany where he is now Vice President Corporate Research & Development. In 1999 he was honored as Professor at RWTH Aachen. His main experience is in the fields of semiconductor growth by MOVPE, Nanotechnology, electronic and optoelectronic devices and circuits.
Prof. Heuken is author and co-author of more than 650 publications in international journals and several invited papers at international conferences. He was President of DGKK (German Crystal Growth Association), he is elected Executive Committee member of the IOCG (International Organization of Crystal Growth), member of VDE/ITG and board member of OptechNet e.V. He acts as referee for international Journals. He has been granted several patents in the field of semiconductor technology. More than 25 publically funded projects were successfully managed by Professor Heuken
Dr. Bernd Schineller received his Ph.D. in electrical engineering from RWTH Aachen in 2000. His research interests are in the fields of semiconductor processing and MOCVD growth of GaN and phosphide/arsenide based semiconductors. He joined AIXTRON AG, Aachen, in January 2000 as a research engineer and headed AIXTRON’s R&D laboratory from September 2000 to until January 2005. Since February 2005 he is Department Manager R&D Projects. He has eleven years of experience in the field of compound semiconductors and is author and co-author of more than 50 publications in international journals and international conferences.
Dr. Christoph Giesen received his Ph.D. in physics from RWTH Aachen in 2001. He focused on the MOCVD of diverse III-V-compound semiconductors using alternative precursors. In 2001 he joined AIXTRON AG in Aachen-Germany as Supervisor of New Technologies. Since February 2005 he is Project Manager R&D Projects. In his functions he is responsible for the coordination and execution of R&D projects within AIXTRON. He has more than twelve years experience in the field of MOCVD technology and ten years in the management of EU and government founded research projects. He is author and co-author of numerous publications in international journals and at international conferences.